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Resist developing device - メーカー・企業と製品の一覧

Resist developing deviceの製品一覧

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Liftoff (Image Reversal) Compatible Photoresist Development Equipment

Liftoff (Image Reversal) Compatible Photoresist Development Equipment

Proven results with a variety of chemical solutions! The reason for our low prices is that we handle everything in-house, from design to sales.

The product is equipped with sheet-type development, front exposure (reverse exposure), baking, and cooling functions. We offer a lineup tailored to production volume, ranging from manual machines to fully automatic machines, and since we handle everything from design to manufacturing and sales in-house, we have achieved low prices. We have a proven track record with a variety of chemicals, including TMAH. 【Features】 ■ Achieves low prices ■ Automatic size recognition ■ Proven track record with a variety of chemicals ■ Reduced footprint ■ Lineup tailored to production volume *For more details, please refer to the PDF document or feel free to contact us.

  • Resist Device

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1 Fluid Spray Type Automatic Photoresist Developer

1 Fluid Spray Type Automatic Photoresist Developer

It is a single-fluid developing device that is effective in reducing the development and processing time of thick films. You can freely choose the spray shape (circular, fan, etc.), pressure, and flow rate.

It is a single-fluid spray-type developing device. Since the spray is generated by the pressure of the developing solution, mist from the spray is less likely to scatter, and it can also speed up the developing process. It is optimal for developing large substrates and thick films. The spray nozzle can be freely selected in terms of shape (such as fan-shaped or circular), distribution, spreading angle, and range. This product is equipped with developing, baking, and cooling functions in a sheet-fed format. With a lineup tailored to production volume, ranging from manual machines to fully automatic machines, we have achieved low prices by handling everything from design to manufacturing and sales in-house. We have a proven track record with a variety of chemicals, including TMAH. 【Features】 ■ Equipped with single-fluid spray (can be used in conjunction with paddles) ■ Automatic wafer size recognition ■ Reduced footprint ■ Lineup tailored to production volume We have a demo setup available, so please consider scheduling a demonstration!

  • Resist Device

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2-fluid spray type automatic photoresist developing device (developer)

2-fluid spray type automatic photoresist developing device (developer)

From high pressure to mist-like soft pressure, it's all under control! A two-fluid spray resist development device. It is effective in shortening the development time for thick films and more.

This is a developing device that uses a two-fluid spray method to mix and discharge N2 and developer solution. By changing the pressure of N2, the discharge pressure of the spray can be adjusted. You can choose from a wide range of spray discharge patterns, such as increasing the liquid pressure for high-pressure discharge or reducing the liquid volume to create a fine mist for a softer discharge. The spray nozzle can be freely selected in various shapes such as fan-shaped or circular, as well as the distribution, spread angle, and range. We offer a lineup that matches production volume, from manual to fully automatic machines, and since we handle everything from design to manufacturing and sales in-house, we have achieved low prices. We have a proven track record with various chemicals, including TMAH. 【Features】 ■ Equipped with a two-fluid spray! (Paddle can also be used) ■ Automatic wafer size recognition function ■ Proven track record with various chemicals ■ Compact design ■ Lineup tailored to production volume We have a permanent demo setup, so please consider scheduling a demonstration!

  • Resist Device

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Semiconductor printed circuit board horizontal manufacturing equipment for solder resist development (finishing process)

Semiconductor printed circuit board horizontal manufacturing equipment for solder resist development (finishing process)

Supports everything from single-layer substrates to flexible substrates using Roll to Roll! No resist residue remains.

We would like to introduce the solder resist development for finishing treatment handled by Fujikiko Co., Ltd. It accommodates everything from single-sided PCBs to flexible PCBs using Roll to Roll. Additionally, due to optimal spray placement, there is no residue left from the resist. 【Features】 ■ Accommodates everything from single-sided PCBs to flexible PCBs using Roll to Roll ■ Optimal spray placement ■ No resist residue left *For more details, please refer to the PDF document or feel free to contact us.

  • Other semiconductor manufacturing equipment
  • Other surface treatment equipment
  • Circuit board processing machine

ブックマークに追加いたしました

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Compact! Manual photoresist developing device (manual developer)

Compact! Manual photoresist developing device (manual developer)

It is a compact resist development system for small-lot, multi-variety production and development applications. Unlike DIP, it can stabilize quality due to its sheet-fed design.

This product is a manual sheet-type developing machine. It features a compact design that combines the chemical solution box and processing cup into one unit. We design, manufacture, and sell manual machines tailored to our customers' needs. It is used not only for research and development purposes but also by customers handling small quantities of diverse products. We have a proven track record with various chemicals, including TMAH. 【Features】 ■ Achieves low cost ■ Compact! ■ Options for paddle, single fluid spray, and dual fluid spray ■ Proven performance with a variety of chemicals *For more details, please refer to the PDF document or feel free to contact us.

  • Resist Device

ブックマークに追加いたしました

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ブックマークを削除いたしました

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これ以上ブックマークできません

会員登録すると、ブックマークできる件数が増えて、ラベルをつけて整理することもできます

無料会員登録
Maintain a constant reverse taper angle! PEB-compatible resist development equipment (developer)

Maintain a constant reverse taper angle! PEB-compatible resist development equipment (developer)

Keep the negative taper angle constant! This is an automatic resist development system compatible with post-exposure bake (PEB) required for negative resist and image reversal resist.

Equipped with sheet-type development, full exposure (inverted exposure, image reversal), baking, and cooling functions. An important PEB that determines the angle of the reverse taper using lift-off resist. Our proprietary program stabilizes the reverse taper angle! Additionally, using it for baking after exposing negative resist achieves a stable process. With a lineup tailored to production volume, from manual machines to fully automatic machines, we have realized low prices by handling everything from design to manufacturing and sales in-house. We have a proven track record with a variety of chemicals such as TMAH, colin aqueous solution, and Na2CO3. We also have numerous achievements with thin wafers (such as wafer thickness of 150um), so please feel free to consult us. 【Features】 ■ Stability of reverse taper angle through PEB ■ Automatic wafer size recognition function ■ Compatible with paddle, single-fluid spray, and dual-fluid spray ■ Reduced footprint ■ Lineup tailored to production volume We also have demo equipment available, so please consider scheduling a demonstration!

  • Resist Device

ブックマークに追加いたしました

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ブックマークを削除いたしました

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会員登録すると、ブックマークできる件数が増えて、ラベルをつけて整理することもできます

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Semi-automatic photoresist developing equipment (semi-auto developer)

Semi-automatic photoresist developing equipment (semi-auto developer)

It is a semi-automatic developer for customers who do not have a high enough production volume to purchase a fully automated machine but seek process reproducibility.

This product is equipped with a sheet-fed development, baking, and cooling unit. It is recommended for customers who have a production volume that is not high enough to introduce an automatic machine, but cannot adopt a manual machine due to labor issues! We design and manufacture semi-automatic machines tailored to your needs, so if you are having trouble introducing new equipment, please consider us! We have a proven track record with various chemicals such as TMAH. 【Features】 ■ Automatic transport function ■ Achieves low cost ■ Proven track record with various chemicals ■ Reduced footprint *Please feel free to contact us for more details.

  • Resist Device

ブックマークに追加いたしました

ブックマーク一覧

ブックマークを削除いたしました

ブックマーク一覧

これ以上ブックマークできません

会員登録すると、ブックマークできる件数が増えて、ラベルをつけて整理することもできます

無料会員登録
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